Effect of Ion Energy on Photoresist Etching in an Inductively Coupled Large Area Plasma Source (LAPS)

K. Takechi and Michael A. Lieberman

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M00/58

2000

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http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/Archive/ERL-00-58.pdf

BibTeX citation:

@techreport{Takechi:M00/58,
    Author= {Takechi, K. and Lieberman, Michael A.},
    Title= {Effect of Ion Energy on Photoresist Etching in an Inductively Coupled Large Area Plasma Source (LAPS)},
    Year= {2000},
    Month= {Nov},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3916.html},
    Number= {UCB/ERL M00/58},
}

EndNote citation:

%0 Report
%A Takechi, K. 
%A Lieberman, Michael A. 
%T Effect of Ion Energy on Photoresist Etching in an Inductively Coupled Large Area Plasma Source (LAPS)
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/58
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3916.html
%F Takechi:M00/58