K. Takechi and Michael A. Lieberman

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M00/58

, 2000

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/ERL-00-58.pdf

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BibTeX citation:

@techreport{Takechi:M00/58,
    Author= {Takechi, K. and Lieberman, Michael A.},
    Title= {Effect of Ion Energy on Photoresist Etching in an Inductively Coupled Large Area Plasma Source (LAPS)},
    Year= {2000},
    Month= {Nov},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3916.html},
    Number= {UCB/ERL M00/58},
}

EndNote citation:

%0 Report
%A Takechi, K. 
%A Lieberman, Michael A. 
%T Effect of Ion Energy on Photoresist Etching in an Inductively Coupled Large Area Plasma Source (LAPS)
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/58
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3916.html
%F Takechi:M00/58