Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications

Sang Hun Lee

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M00/63

2000

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http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/Archive/ERL-00-63.pdf

Advisors: Jeffrey Bokor

BibTeX citation:

@phdthesis{Lee:M00/63,
    Author= {Lee, Sang Hun},
    Title= {Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications},
    School= {EECS Department, University of California, Berkeley},
    Year= {2000},
    Month= {Dec},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3926.html},
    Number= {UCB/ERL M00/63},
}

EndNote citation:

%0 Thesis
%A Lee, Sang Hun 
%T Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/63
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3926.html
%F Lee:M00/63