Effect of Ar Addition to an O2 Plasma in a Large Area Plasma Source: O2/Ar Mixture Plasma Modeling and Photoresist Etching

K. Takechi and Michael A. Lieberman

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M01/1

2001

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http://www2.eecs.berkeley.edu/Pubs/TechRpts/2001/Archive/ERL-01-1.pdf

BibTeX citation:

@techreport{Takechi:M01/1,
    Author= {Takechi, K. and Lieberman, Michael A.},
    Title= {Effect of Ar Addition to an O2 Plasma in a Large Area Plasma Source: O2/Ar Mixture Plasma Modeling and Photoresist Etching},
    Year= {2001},
    Month= {Jan},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2001/3933.html},
    Number= {UCB/ERL M01/1},
}

EndNote citation:

%0 Report
%A Takechi, K. 
%A Lieberman, Michael A. 
%T Effect of Ar Addition to an O2 Plasma in a Large Area Plasma Source: O2/Ar Mixture Plasma Modeling and Photoresist Etching
%I EECS Department, University of California, Berkeley
%D 2001
%@ UCB/ERL M01/1
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2001/3933.html
%F Takechi:M01/1