Effect of Ar Addition to an O2 Plasma in a Large Area Plasma Source: O2/Ar Mixture Plasma Modeling and Photoresist Etching

K. Takechi and Michael A. Lieberman

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M01/1
January 2001

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2001/ERL-01-1.pdf

BibTeX citation:

@techreport{Takechi:M01/1,
    Author = {Takechi, K. and Lieberman, Michael A.},
    Title = {Effect of Ar Addition to an O2 Plasma in a Large Area Plasma Source: O2/Ar Mixture Plasma Modeling and Photoresist Etching},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {2001},
    Month = {Jan},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2001/3933.html},
    Number = {UCB/ERL M01/1}
}

EndNote citation:

%0 Report
%A Takechi, K.
%A Lieberman, Michael A.
%T Effect of Ar Addition to an O2 Plasma in a Large Area Plasma Source: O2/Ar Mixture Plasma Modeling and Photoresist Etching
%I EECS Department, University of California, Berkeley
%D 2001
%@ UCB/ERL M01/1
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2001/3933.html
%F Takechi:M01/1