Comprehensive Model for Projection Photolithography: Rigorous, Fast and Novel Processing

Mosong Cheng

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M02/1
January 2002

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/ERL-02-1.pdf

Advisor: Andrew R. Neureuther

BibTeX citation:

@phdthesis{Cheng:M02/1,
    Author = {Cheng, Mosong},
    Title = {Comprehensive Model for Projection Photolithography: Rigorous, Fast and Novel Processing},
    School = {EECS Department, University of California, Berkeley},
    Year = {2002},
    Month = {Jan},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/3957.html},
    Number = {UCB/ERL M02/1}
}

EndNote citation:

%0 Thesis
%A Cheng, Mosong
%T Comprehensive Model for Projection Photolithography: Rigorous, Fast and Novel Processing
%I EECS Department, University of California, Berkeley
%D 2002
%@ UCB/ERL M02/1
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/3957.html
%F Cheng:M02/1