Comprehensive Model for Projection Photolithography: Rigorous, Fast and Novel Processing

Mosong Cheng

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M02/1

2002

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http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/Archive/ERL-02-1.pdf

Advisors: Andrew R. Neureuther

BibTeX citation:

@phdthesis{Cheng:M02/1,
    Author= {Cheng, Mosong},
    Title= {Comprehensive Model for Projection Photolithography: Rigorous, Fast and Novel Processing},
    School= {EECS Department, University of California, Berkeley},
    Year= {2002},
    Month= {Jan},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/3957.html},
    Number= {UCB/ERL M02/1},
}

EndNote citation:

%0 Thesis
%A Cheng, Mosong 
%T Comprehensive Model for Projection Photolithography: Rigorous, Fast and Novel Processing
%I EECS Department, University of California, Berkeley
%D 2002
%@ UCB/ERL M02/1
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/3957.html
%F Cheng:M02/1