Comprehensive Model for Projection Photolithography: Rigorous, Fast and Novel Processing
Mosong Cheng
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M02/1
, 2002
http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/ERL-02-1.pdf
Advisors: Andrew R. Neureuther
BibTeX citation:
@phdthesis{Cheng:M02/1, Author= {Cheng, Mosong}, Title= {Comprehensive Model for Projection Photolithography: Rigorous, Fast and Novel Processing}, School= {EECS Department, University of California, Berkeley}, Year= {2002}, Month= {Jan}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/3957.html}, Number= {UCB/ERL M02/1}, }
EndNote citation:
%0 Thesis %A Cheng, Mosong %T Comprehensive Model for Projection Photolithography: Rigorous, Fast and Novel Processing %I EECS Department, University of California, Berkeley %D 2002 %@ UCB/ERL M02/1 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/3957.html %F Cheng:M02/1