Coulomb Interactions in High Throughput Electron Beam Lithography
B. Wu
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M02/4
, 2002
http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/ERL-02-4.pdf
BibTeX citation:
@techreport{Wu:M02/4, Author= {Wu, B.}, Title= {Coulomb Interactions in High Throughput Electron Beam Lithography}, Year= {2002}, Month= {Feb}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/3964.html}, Number= {UCB/ERL M02/4}, }
EndNote citation:
%0 Report %A Wu, B. %T Coulomb Interactions in High Throughput Electron Beam Lithography %I EECS Department, University of California, Berkeley %D 2002 %@ UCB/ERL M02/4 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/3964.html %F Wu:M02/4