Coulomb Interactions in High Throughput Electron Beam Lithography

B. Wu

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M02/4
February 2002

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/ERL-02-4.pdf

BibTeX citation:

@techreport{Wu:M02/4,
    Author = {Wu, B.},
    Title = {Coulomb Interactions in High Throughput Electron Beam Lithography},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {2002},
    Month = {Feb},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/3964.html},
    Number = {UCB/ERL M02/4}
}

EndNote citation:

%0 Report
%A Wu, B.
%T Coulomb Interactions in High Throughput Electron Beam Lithography
%I EECS Department, University of California, Berkeley
%D 2002
%@ UCB/ERL M02/4
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2002/3964.html
%F Wu:M02/4