Junwei Bao

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M03/2

, 2003

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/ERL-03-2.pdf

Advisors: Costas J. Spanos

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BibTeX citation:

@phdthesis{Bao:M03/2,
    Author= {Bao, Junwei},
    Title= {An Optical Metrology System for Lithography Process Monitoring and Control},
    School= {EECS Department, University of California, Berkeley},
    Year= {2003},
    Month= {Jan},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4050.html},
    Number= {UCB/ERL M03/2},
}

EndNote citation:

%0 Thesis
%A Bao, Junwei 
%T An Optical Metrology System for Lithography Process Monitoring and Control
%I EECS Department, University of California, Berkeley
%D 2003
%@ UCB/ERL M03/2
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4050.html
%F Bao:M03/2