Junwei Bao
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M03/2
January 2003
http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/ERL-03-2.pdf
Advisor: Costas J. Spanos
BibTeX citation:
@phdthesis{Bao:M03/2, Author = {Bao, Junwei}, Title = {An Optical Metrology System for Lithography Process Monitoring and Control}, School = {EECS Department, University of California, Berkeley}, Year = {2003}, Month = {Jan}, URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4050.html}, Number = {UCB/ERL M03/2} }
EndNote citation:
%0 Thesis %A Bao, Junwei %T An Optical Metrology System for Lithography Process Monitoring and Control %I EECS Department, University of California, Berkeley %D 2003 %@ UCB/ERL M03/2 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4050.html %F Bao:M03/2