Advanced Gate Stack Materials and Processes for Sub-100nm CMOS Appliciations

Qiang Lu

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M03/4
2003

Advisor: Chenming Hu


BibTeX citation:

@phdthesis{Lu:M03/4,
    Author = {Lu, Qiang},
    Title = {Advanced Gate Stack Materials and Processes for Sub-100nm CMOS Appliciations},
    School = {EECS Department, University of California, Berkeley},
    Year = {2003},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4052.html},
    Number = {UCB/ERL M03/4}
}

EndNote citation:

%0 Thesis
%A Lu, Qiang
%T Advanced Gate Stack Materials and Processes for Sub-100nm CMOS Appliciations
%I EECS Department, University of California, Berkeley
%D 2003
%@ UCB/ERL M03/4
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4052.html
%F Lu:M03/4