First Principle-based State Estimator for Photolithography Control Using Full Profile Metrology

P. D. Friedberg

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M03/16

2003

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http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/Archive/ERL-03-16.pdf

BibTeX citation:

@techreport{Friedberg:M03/16,
    Author= {Friedberg, P. D.},
    Title= {First Principle-based State Estimator for Photolithography Control Using Full Profile Metrology},
    Year= {2003},
    Month= {May},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4085.html},
    Number= {UCB/ERL M03/16},
}

EndNote citation:

%0 Report
%A Friedberg, P. D. 
%T First Principle-based State Estimator for Photolithography Control Using Full Profile Metrology
%I EECS Department, University of California, Berkeley
%D 2003
%@ UCB/ERL M03/16
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4085.html
%F Friedberg:M03/16