First Principle-based State Estimator for Photolithography Control Using Full Profile Metrology
P. D. Friedberg
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M03/16
2003
http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/ERL-03-16.pdf
BibTeX citation:
@techreport{Friedberg:M03/16,
Author= {Friedberg, P. D.},
Title= {First Principle-based State Estimator for Photolithography Control Using Full Profile Metrology},
Year= {2003},
Month= {May},
Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4085.html},
Number= {UCB/ERL M03/16},
}
EndNote citation:
%0 Report %A Friedberg, P. D. %T First Principle-based State Estimator for Photolithography Control Using Full Profile Metrology %I EECS Department, University of California, Berkeley %D 2003 %@ UCB/ERL M03/16 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4085.html %F Friedberg:M03/16