Design, Fabrication, and Optical Analysis of Nanomirrors for Maskless EUV Lithography

Yashesh A. Shroff

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M04/32
December 2003

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/ERL-04-32.pdf

Advisor: William G. Oldham


BibTeX citation:

@phdthesis{Shroff:M04/32,
    Author = {Shroff, Yashesh A.},
    Title = {Design, Fabrication, and Optical Analysis of Nanomirrors for Maskless EUV Lithography},
    School = {EECS Department, University of California, Berkeley},
    Year = {2003},
    Month = {Dec},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4242.html},
    Number = {UCB/ERL M04/32}
}

EndNote citation:

%0 Thesis
%A Shroff, Yashesh A.
%T Design, Fabrication, and Optical Analysis of Nanomirrors for Maskless EUV Lithography
%I EECS Department, University of California, Berkeley
%D 2003
%@ UCB/ERL M04/32
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4242.html
%F Shroff:M04/32