Design, Fabrication, and Optical Analysis of Nanomirrors for Maskless EUV Lithography
Yashesh A. Shroff
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M04/32
, 2003
http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/ERL-04-32.pdf
Advisors: William G. Oldham
BibTeX citation:
@phdthesis{Shroff:M04/32, Author= {Shroff, Yashesh A.}, Title= {Design, Fabrication, and Optical Analysis of Nanomirrors for Maskless EUV Lithography}, School= {EECS Department, University of California, Berkeley}, Year= {2003}, Month= {Dec}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4242.html}, Number= {UCB/ERL M04/32}, }
EndNote citation:
%0 Thesis %A Shroff, Yashesh A. %T Design, Fabrication, and Optical Analysis of Nanomirrors for Maskless EUV Lithography %I EECS Department, University of California, Berkeley %D 2003 %@ UCB/ERL M04/32 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4242.html %F Shroff:M04/32