Modeling and Calibration of Resist Processes in Photolithography

Lei Yuan

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M05/26
May 2005

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2005/ERL-05-26.pdf

BibTeX citation:

@techreport{Yuan:M05/26,
    Author = {Yuan, Lei},
    Title = {Modeling and Calibration of Resist Processes in Photolithography},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {2005},
    Month = {May},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2005/29053.html},
    Number = {UCB/ERL M05/26}
}

EndNote citation:

%0 Report
%A Yuan, Lei
%T Modeling and Calibration of Resist Processes in Photolithography
%I EECS Department, University of California, Berkeley
%D 2005
%@ UCB/ERL M05/26
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2005/29053.html
%F Yuan:M05/26