Lei Yuan

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M05/26

, 2005

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2005/ERL-05-26.pdf

---

BibTeX citation:

@techreport{Yuan:M05/26,
    Author= {Yuan, Lei},
    Title= {Modeling and Calibration of Resist Processes in Photolithography},
    Year= {2005},
    Month= {May},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2005/29053.html},
    Number= {UCB/ERL M05/26},
}

EndNote citation:

%0 Report
%A Yuan, Lei 
%T Modeling and Calibration of Resist Processes in Photolithography
%I EECS Department, University of California, Berkeley
%D 2005
%@ UCB/ERL M05/26
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2005/29053.html
%F Yuan:M05/26