Modeling and Calibration of Resist Processes in Photolithography
Lei Yuan
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M05/26
, 2005
http://www2.eecs.berkeley.edu/Pubs/TechRpts/2005/ERL-05-26.pdf
BibTeX citation:
@techreport{Yuan:M05/26, Author= {Yuan, Lei}, Title= {Modeling and Calibration of Resist Processes in Photolithography}, Year= {2005}, Month= {May}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2005/29053.html}, Number= {UCB/ERL M05/26}, }
EndNote citation:
%0 Report %A Yuan, Lei %T Modeling and Calibration of Resist Processes in Photolithography %I EECS Department, University of California, Berkeley %D 2005 %@ UCB/ERL M05/26 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2005/29053.html %F Yuan:M05/26