Brittany Marie McClinton

EECS Department, University of California, Berkeley

Technical Report No. UCB/EECS-2011-127

December 11, 2011

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2011/EECS-2011-127.pdf

Advisors: David T. Attwood

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BibTeX citation:

@phdthesis{McClinton:EECS-2011-127,
    Author= {McClinton, Brittany Marie},
    Title= {Mask Roughness Induced LER in EUV Lithography},
    School= {EECS Department, University of California, Berkeley},
    Year= {2011},
    Month= {Dec},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2011/EECS-2011-127.html},
    Number= {UCB/EECS-2011-127},
}

EndNote citation:

%0 Thesis
%A McClinton, Brittany Marie 
%T Mask Roughness Induced LER in EUV Lithography
%I EECS Department, University of California, Berkeley
%D 2011
%8 December 11
%@ UCB/EECS-2011-127
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2011/EECS-2011-127.html
%F McClinton:EECS-2011-127