William G. Oldham

Research Areas

Integrated circuits; Semiconductor manufacturing

Biography

He received his B.S. from the Carnegie Institute of Technology, 1960, his M. S. and Ph.D. from the Carnegie Institute of Technology, 1961 and 1963 respectively.

From he worked for Siemens Research Laboratory in Erlangen, Germany. He joined the Electrical Engineering department, UC Berkeley, California in 1964. From he was Director of the Electronics Research Laboratory and Principal Investigator, Joint Services Electronics Program. From he was Director of California SEMATECH Center of Excellence, and from he was Director of DARPA/SRC Research Network for Advanced Lithography. He was also Vice Chair Academic Senate,, Chair. Chair, Senate Ombudsperson Committee, and Secretary, Berkeley Division Academic Senate.

He was elected National Science Foundation Senior Postdoctoral Fellow at Technical University, Munich,, Fellow of IEEE 1981, Guggenheim Fellow,, and to the National Academy of Engineering, 1986. He has received the SRC Technical Excellence Award, 1997, SIA University Research Award, 2003, and the IEEE Cledo Brunetti Award, 2005

Professor Oldham has more than 200 publications and 10 Patents in semiconductor electronics.

Education

1963, PhD, EE, Carnegie Inst. of Technology
1961, MS, EE, Carnegie Inst. of Technology
1960, BS, EE, Carnegie Inst. of Technology

Selected Publications

Y. Chen, C. H. Chu, Y. Shroff, J. Wang, and W. G. Oldham, "Design and fabrication of tilting and piston micromirrors for maskless lithography," in Emerging Lithographic Technologies IX, R. S. Mackay, Ed., Proceedings of the SPIE, Vol. 5751, SPIE, 2005, pp. 1023-1037.
W. G. Oldham and Y. Shroff, "Mirror-based pattern generation for maskless lithography," Microelectronic Engineering, vol. 73-74, no. 1, pp. 42-47, June 2004.
B. Nikolic, B. Wild, V. Dai, Y. A. Shroff, B. Warlick, A. Zakhor, and W. G. Oldham, "Layout decompression chip for maskless lithography," in Proc. SPIE: Emerging Lithographic Technologies VIII, R. S. Mackay, Ed., Vol. 5374, Bellingham, WA: SPIE, 2004, pp. 1092-1099.
Y. A. Shroff, Y. Chen, and W. G. Oldham, "Image optimization for maskless lithography," in Emerging Lithographic Technologies VIII, R. S. Mackay, Ed., Proceedings of the SPIE, Vol. 5374, SPIE, 2004, pp. 637-647.
Y. A. Shroff, Y. Chen, and W. G. Oldham, "Optical analysis of mirror based pattern generation," in Emerging Lithographic Technologies VII, R. L. Engelstad, Ed., Proceedings of the SPIE, Vol. 5037, SPIE, 2003, pp. 550-559.
Y. Shroff, Y. Chen, and W. G. Oldham, "Fabrication of parallel-plate nanomirror arrays for extreme ultraviolet maskless lithography," J. Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 6, pp. 2412-2415, Nov. 2001.
S. H. Lee, P. Naulleau, K. A. Goldberg, F. Piao, W. G. Oldham, and J. Bokor, "Phase-shifting point-diffraction interferometry at 193 nm," Applied Optics, vol. 39, no. 31, pp. 5768-5772, Nov. 2000.
Y. Chen, Y. Shroff, and W. G. Oldham, "Transient optimization of an electrically-damped cantilever-supported microactuator and the pull-in analysis," in Proc. ASME Intl. Mechanical Engineering Congress and Exposition: MEMS 2000, A. P. Lee, A. P. Malshe, F. K. Forster, Q. Tan, and R. S. Keynton, Eds., New York, NY: ASME, 2000, pp. 319-324.
Y. Chen, Y. Shroff, and W. G. Oldham, "Switching of a double-comb microactuator by time-lag modulation and electrical-damping control," in Proc. ASME Intl. Mechanical Engineering Congress and Exposition: MEMS 2000, A. P. Lee, A. P. Malshe, F. K. Forster, Q. Tan, and R. S. Keynton, Eds., New York, NY: ASME, 2000, pp. 157-160.
F. Piao, W. G. Oldham, and E. Haller, "Ultraviolet-induced densification of fused silica," J. Applied Physics, vol. 87, no. 7, pp. 3287-3293, April 2000.
N. Choksi, D. S. Pickard, M. McCord, R. F. W. Pease, Y. Shroff, Y. Chen, W. G. Oldham, and D. Markle, "Maskless extreme ultraviolet lithography," J. Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 17, no. 6, pp. 3047-3051, Nov. 1999.
F. Piao, W. G. Oldham, and E. E. Haller, "Thermal annealing of deep ultraviolet (193 nm) induced compaction in fused silica," J. Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 16, no. 6, pp. 3419-3421, Nov. 1998.
C. H. Fields, W. G. Oldham, A. K. Ray-Chaudhuri, K. D. Krenz, and R. H. Stulen, "Direct aerial image measurements to evaluate the performance of an extreme ultraviolet projection lithography system," J. Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 14, no. 6, pp. 4000-4003, Nov. 1996.
J. Bokor, A. R. Neureuther, and W. G. Oldham, "Advanced lithography for ULSI," IEEE Circuits and Devices Magazine, vol. 12, no. 1, pp. 11-15, Jan. 1996.
Y. Shih, G. Zhang, C. Hu, and W. G. Oldham, "Thin dielectric degradation during silicon selective epitaxial growth process," Applied Physics Letters, vol. 67, no. 14, pp. 2040-2042, Oct. 1995.
Y. Shacham-Diamand, A. Dedhia, D. Hoffstetter, and W. G. Oldham, "Copper transport in thermal SiO2," J. Electrochemical Society, vol. 140, no. 8, pp. 2427-2432, Aug. 1993.
S. E. Schwarz and W. G. Oldham, Electrical Engineering: An Introduction, 1st ed., HRW Series in Electrical and Computer Engineering, New York, NY: Holt, Rinehart, and Winston, 1984.
W. G. Oldham, A. R. Neureuther, C. Sung, J. L. Reynolds, and S. N. Nandgaonkar, "A general simulator for VLSI lithography and etching processes: Part II--Application to deposition and etching," IEEE Trans. Electron Devices, vol. 27, no. 8, pp. 1455-1459, Aug. 1980.
W. G. Oldham, S. N. Nandgaonkar, A. R. Neureuther, and M. O'Toole, "A general simulator for VLSI lithography and etching processes: Part I--Application to projection lithography," IEEE Trans. Electron Devices, vol. 26, no. 4, pp. 717-722, April 1979.
W. G. Oldham, "The fabrication of microelectronic circuits," Scientific American, vol. 237, no. 3, pp. 111-114, Sep. 1977.