Plasma Immersion Ion Implantation for VLSI Fabrication

X.Y. Qian, Nathan W. Cheung and Michael A. Lieberman

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M90/84
September 1990

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1990/ERL-90-84.pdf

BibTeX citation:

@techreport{Qian:M90/84,
    Author = {Qian, X.Y. and Cheung, Nathan W. and Lieberman, Michael A.},
    Title = {Plasma Immersion Ion Implantation for VLSI Fabrication},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1990},
    Month = {Sep},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1990/1589.html},
    Number = {UCB/ERL M90/84}
}

EndNote citation:

%0 Report
%A Qian, X.Y.
%A Cheung, Nathan W.
%A Lieberman, Michael A.
%T Plasma Immersion Ion Implantation for VLSI Fabrication
%I EECS Department, University of California, Berkeley
%D 1990
%@ UCB/ERL M90/84
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1990/1589.html
%F Qian:M90/84