Simulation of Topography Scattering for Optical Lithography with the Connection Machine

J.K. Gamelin

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M89/71
June 1989

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/ERL-89-71.pdf

BibTeX citation:

@techreport{Gamelin:M89/71,
    Author = {Gamelin, J.K.},
    Title = {Simulation of Topography Scattering for Optical Lithography with the Connection Machine},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1989},
    Month = {Jun},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/1259.html},
    Number = {UCB/ERL M89/71}
}

EndNote citation:

%0 Report
%A Gamelin, J.K.
%T Simulation of Topography Scattering for Optical Lithography with the Connection Machine
%I EECS Department, University of California, Berkeley
%D 1989
%@ UCB/ERL M89/71
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/1259.html
%F Gamelin:M89/71