X.Y. Qian and Nathan W. Cheung and Michael A. Lieberman

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M90/84

, 1990

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1990/ERL-90-84.pdf

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BibTeX citation:

@techreport{Qian:M90/84,
    Author= {Qian, X.Y. and Cheung, Nathan W. and Lieberman, Michael A.},
    Title= {Plasma Immersion Ion Implantation for VLSI Fabrication},
    Year= {1990},
    Month= {Sep},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1990/1589.html},
    Number= {UCB/ERL M90/84},
}

EndNote citation:

%0 Report
%A Qian, X.Y. 
%A Cheung, Nathan W. 
%A Lieberman, Michael A. 
%T Plasma Immersion Ion Implantation for VLSI Fabrication
%I EECS Department, University of California, Berkeley
%D 1990
%@ UCB/ERL M90/84
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1990/1589.html
%F Qian:M90/84