Model of Plasma Immersion Ion Implantation for Voltage Pulses with Finite Rise- and Fall-Times
R.A. Stewart and Michael A. Lieberman
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M91/14
, 1991
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-14.pdf
BibTeX citation:
@techreport{Stewart:M91/14, Author= {Stewart, R.A. and Lieberman, Michael A.}, Title= {Model of Plasma Immersion Ion Implantation for Voltage Pulses with Finite Rise- and Fall-Times}, Year= {1991}, Month= {Feb}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1702.html}, Number= {UCB/ERL M91/14}, }
EndNote citation:
%0 Report %A Stewart, R.A. %A Lieberman, Michael A. %T Model of Plasma Immersion Ion Implantation for Voltage Pulses with Finite Rise- and Fall-Times %I EECS Department, University of California, Berkeley %D 1991 %@ UCB/ERL M91/14 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1702.html %F Stewart:M91/14