Frequency-Conversion Optics for 213-nm Optical Lithography Light Source
E. Tejnil
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M94/27
, 1994
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1994/ERL-94-27.pdf
BibTeX citation:
@techreport{Tejnil:M94/27, Author= {Tejnil, E.}, Title= {Frequency-Conversion Optics for 213-nm Optical Lithography Light Source}, Year= {1994}, Month= {Apr}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1994/2539.html}, Number= {UCB/ERL M94/27}, }
EndNote citation:
%0 Report %A Tejnil, E. %T Frequency-Conversion Optics for 213-nm Optical Lithography Light Source %I EECS Department, University of California, Berkeley %D 1994 %@ UCB/ERL M94/27 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1994/2539.html %F Tejnil:M94/27