Frequency-Conversion Optics for 213-nm Optical Lithography Light Source

E. Tejnil

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M94/27
April 1994

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1994/ERL-94-27.pdf

BibTeX citation:

@techreport{Tejnil:M94/27,
    Author = {Tejnil, E.},
    Title = {Frequency-Conversion Optics for 213-nm Optical Lithography Light Source},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1994},
    Month = {Apr},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1994/2539.html},
    Number = {UCB/ERL M94/27}
}

EndNote citation:

%0 Report
%A Tejnil, E.
%T Frequency-Conversion Optics for 213-nm Optical Lithography Light Source
%I EECS Department, University of California, Berkeley
%D 1994
%@ UCB/ERL M94/27
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1994/2539.html
%F Tejnil:M94/27