Frequency-Conversion Optics for 213-nm Optical Lithography Light Source

E. Tejnil

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M94/27

1994

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http://www2.eecs.berkeley.edu/Pubs/TechRpts/1994/Archive/ERL-94-27.pdf

BibTeX citation:

@techreport{Tejnil:M94/27,
    Author= {Tejnil, E.},
    Title= {Frequency-Conversion Optics for 213-nm Optical Lithography Light Source},
    Year= {1994},
    Month= {Apr},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1994/2539.html},
    Number= {UCB/ERL M94/27},
}

EndNote citation:

%0 Report
%A Tejnil, E. 
%T Frequency-Conversion Optics for 213-nm Optical Lithography Light Source
%I EECS Department, University of California, Berkeley
%D 1994
%@ UCB/ERL M94/27
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1994/2539.html
%F Tejnil:M94/27