Applying TCAD to Emerging Technologies

Derek C. Lee

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M95/38
May 1995

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1995/ERL-95-38.pdf

Computer-Aided Design (CAD) of integrated circuits is well established. It is near possible to design a complex circuit without circuit simulation. Tools exist for mask layout, schematic capture, circuit extraction, layout automation, etc. Process simulation tools--classified as Technology CAD (TCAD) tools--are not nearly as well established but are becoming increasingly more important as new technologies emerge with new levels of process complexity. Two such technologies which stand to benefit from TCAD applications are EUV (Extreme Ultra Violet) project lithography, and fabrication of MEMS (MicroElectroMechanical System) devices. Creation and application of simulation tools for these technologies are the focus of this project.

This report is divided into two main parts consisting of three chapters. Chapters 2 and 3 discusses the use of lithography simulation for EUV projection lithography, in which simulation was carried out with the SPLAT program. The second part, consisting of Chapter 4, discusses research related to process simulation of MEMS devices using the SIMPL System 6 simulation software.

BibTeX citation:

@techreport{Lee:M95/38,
    Author = {Lee, Derek C.},
    Title = {Applying TCAD to Emerging Technologies},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1995},
    Month = {May},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1995/2774.html},
    Number = {UCB/ERL M95/38},
    Abstract = {Computer-Aided Design (CAD) of integrated circuits is well
established. It is near possible to design a complex circuit without
circuit simulation. Tools exist for mask layout, schematic capture,
circuit extraction, layout automation, etc. Process simulation
tools--classified as Technology CAD (TCAD) tools--are not nearly as
well established but are becoming increasingly more important as new
technologies emerge with new levels of process complexity. Two such
technologies which stand to benefit from TCAD applications are EUV
(Extreme Ultra Violet) project lithography, and fabrication of MEMS
(MicroElectroMechanical System) devices. Creation and application
of simulation tools for these technologies are the focus of this
project.

This report is divided into two main parts consisting of three
chapters. Chapters 2 and 3 discusses the use of lithography
simulation for EUV projection lithography, in which simulation was
carried out with the SPLAT program. The second part, consisting of
Chapter 4, discusses research related to process simulation of MEMS
devices using the SIMPL System 6 simulation software.}
}

EndNote citation:

%0 Report
%A Lee, Derek C.
%T Applying TCAD to Emerging Technologies
%I EECS Department, University of California, Berkeley
%D 1995
%@ UCB/ERL M95/38
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1995/2774.html
%F Lee:M95/38