Deep Sub-Micron Photolithography Control Through In-Line Metrology
Nickhil H. Jakatdar
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M00/11
, 2000
http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/ERL-00-11.pdf
Advisors: Costas J. Spanos
BibTeX citation:
@phdthesis{Jakatdar:M00/11, Author= {Jakatdar, Nickhil H.}, Title= {Deep Sub-Micron Photolithography Control Through In-Line Metrology}, School= {EECS Department, University of California, Berkeley}, Year= {2000}, Month= {Jan}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3817.html}, Number= {UCB/ERL M00/11}, }
EndNote citation:
%0 Thesis %A Jakatdar, Nickhil H. %T Deep Sub-Micron Photolithography Control Through In-Line Metrology %I EECS Department, University of California, Berkeley %D 2000 %@ UCB/ERL M00/11 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3817.html %F Jakatdar:M00/11