Deep Sub-Micron Photolithography Control Through In-Line Metrology

Nickhil H. Jakatdar

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M00/11

2000

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http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/Archive/ERL-00-11.pdf

Advisors: Costas J. Spanos

BibTeX citation:

@phdthesis{Jakatdar:M00/11,
    Author= {Jakatdar, Nickhil H.},
    Title= {Deep Sub-Micron Photolithography Control Through In-Line Metrology},
    School= {EECS Department, University of California, Berkeley},
    Year= {2000},
    Month= {Jan},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3817.html},
    Number= {UCB/ERL M00/11},
}

EndNote citation:

%0 Thesis
%A Jakatdar, Nickhil H. 
%T Deep Sub-Micron Photolithography Control Through In-Line Metrology
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/11
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3817.html
%F Jakatdar:M00/11