0.35um CMOS Process on Six-Inch Wafers - Baseline Report IV
A. Horvath and S. Parsa and H. Y. Wong
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M05/15
, 2005
http://www2.eecs.berkeley.edu/Pubs/TechRpts/2005/ERL-05-15.pdf
BibTeX citation:
@techreport{Horvath:M05/15, Author= {Horvath, A. and Parsa, S. and Wong, H. Y.}, Title= {0.35um CMOS Process on Six-Inch Wafers - Baseline Report IV}, Year= {2005}, Month= {Apr}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2005/4316.html}, Number= {UCB/ERL M05/15}, }
EndNote citation:
%0 Report %A Horvath, A. %A Parsa, S. %A Wong, H. Y. %T 0.35um CMOS Process on Six-Inch Wafers - Baseline Report IV %I EECS Department, University of California, Berkeley %D 2005 %@ UCB/ERL M05/15 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2005/4316.html %F Horvath:M05/15