Mask Roughness Induced LER in EUV Lithography
Brittany Marie McClinton [2011]

Resolution Characterization and Nanofabrication for Soft X-Ray Zone Plate Microscopy
Weilun Chao [2005]

Tunable Coherent Radiation at Soft X-Ray Wavelengths: Generation and Interferometric Applications
Kristine M. Rosfjord [2004]

Coherence Techniques at Extreme Ultraviolet Wavelengths
Chang Chang [2002]

Optical Constants of Materials in the EUV/Soft X-Ray Region for Multilayer Mirror Applications
Regina Soufli [1997]

Grating-Based Soft X-Ray Spatial Frequency Multiplication
Max Wei [1995]

Reflective Masks for Extreme Ultraviolet Lithography
Khanh B. Nguyen [1994]