D. Zeng, Y. Tan, and C. J. Spanos, "Dimensionality reduction methods in virtual metrology," in Metrology, Inspection, and Process Control for Microlithography XXII, J. A. Allgair and C. J. Raymond, Eds., Proceedings of SPIE, Vol. 6922, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 38-1-11.
J. Xue, C. J. Spanos, and A. R. Neureuther, "Probe-pattern grating focus monitor through scatterometry calibration," in Metrology, Inspection, and Process Control for Microlithography XXII, J. A. Allgair and C. J. Raymond, Eds., Proceedings of SPIE, Vol. 6922, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 25-1-12.
K. Patel, T. King Liu, and C. J. Spanos, "Impact of gate line edge roughness on double-gate FinFET performance variability," in Design for Manufacturability through Design-Process Integration II, V. K. Singh and M. L. Rieger, Eds., Proceedings of SPIE, Vol. 6925, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 1I-1-10.
K. Qian and C. J. Spanos, "A comprehensive model of process variability for statistical timing optimization," in Design for Manufacturability through Design-Process Integration II, V. K. Singh and M. L. Rieger, Eds., Proceedings of SPIE, Vol. 6925, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 1G-1-11.
Y. Ben, J. Xue, and C. J. Spanos, "Using composite gratings for optical system characterization through scatterometry," in Design for Manufacturability through Design-Process Integration II, V. K. Singh and M. L. Rieger, Eds., Proceedings of SPIE, Vol. 6925, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 1B-1-12.
Q. Y. Tang and C. J. Spanos, "Layout optimization based on a generalized process variability model," in Design for Manufacturability through Design-Process Integration II, V. K. Singh and M. L. Rieger, Eds., Proceedings of SPIE, Vol. 6925, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 0F-1-12.
N. Ma, J. Ghan, S. Mishra, C. J. Spanos, K. Poolla, N. Rodriguez, and L. Capodieci, "Automatic hotspot classification using pattern-based clustering," in Design for Manufacturability through Design-Process Integration II, V. K. Singh and M. L. Rieger, Eds., Proceedings of SPIE, Vol. 6925, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2008, pp. 05-1-10.
J. Xue, Y. Ben, C. Wang, M. Miller, C. J. Spanos, and A. R. Neureuther, "Parameter sensitive patterns for scatterometry monitoring," in Photomask Technology 2007, R. J. Naber and H. Kawahira, Eds., Proceedings of SPIE, Vol. 6730, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2007, pp. 4S-1-10.
J. Xue, K. Moen, and C. J. Spanos, "Integrated aerial image sensor: Modeling and assembly," in Metrology, Inspection, and Process Control for Microlithography XX, C. N. Archie, Ed., Proceedings of SPIE, Vol. 6152, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2006, pp. 211-1-8.
P. Friedberg, W. Cheung, and C. J. Spanos, "Spatial modeling of micon-scale gate length variation," in Data Analysis and Modeling for Process Control III, I. Emami and K. W. Tobin, Jr., Eds., Proceedings of SPIE, Vol. 6155, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2006, pp. 0C-1-12.
Q. Zhang, K. Poolla, and C. J. Spanos, "Modeling of mask thermal distortion and its dependency on pattern density," in Photomask and Next-Generation Lithography Mask Technology XII, M. Komuro, Ed., Proceedings of SPIE, Vol. 5853, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 234-242.
P. Friedberg, Y. Cao, J. Cain, R. Wang, J. M. Rabaey, and C. J. Spanos, "Modeling within-field gate length spatial variation for process-design co-optimization," in Design and Process Integration for Microelectronic Manufacturing III, L. W. Liebermann, Ed., Proceedings of SPIE, Vol. 5756, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 178-188.
J. P. Cain, P. Naulleau, and C. J. Spanos, "Modeling of EUV photoresists with a resist point spread function," in Emerging Lithographic Technologies IX, R. S. Mackay, Ed., Proceedings of SPIE, Vol. 5751, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 1101-1109.
J. P. Cain, G. McIntyre, P. Naulleau, A. Pawloski, B. La Fontaine, O. Wood, C. J. Spanos, and A. R. Neureuther, "Two-wave pattern shift aberration monitor for centrally obscured optical systems," in Emerging Lithographic Technologies IX, R. S. Mackay, Ed., Proceedings of SPIE, Vol. 5751, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 1230-1237.
J. Xue and C. J. Spanos, "Design of an integrated aerial image sensor," in Metrology, Inspection, and Process Control for Microlithography XIX, R. M. Silver, Ed., Proceedings of SPIE, Vol. 5752, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 392-403.
Q. Zhang, C. Tang, T. Hsieh, N. Maccrae, B. Singh, K. Poolla, and C. J. Spanos, "Comprehensive CD uniformity control across lithography and etch," in Metrology, Inspection, and Process Control for Microlithography XIX, R. M. Silver, Ed., Proceedings of SPIE, Vol. 5752, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2005, pp. 692-701.
Q. Zhang, P. D. Friedberg, C. Tang, B. Singh, K. Poolla, and C. J. Spanos, "Across-wafer CD uniformity enhancement through control of multizone PEB profiles," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, Ed., Proceedings of SPIE, Vol. 5375, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2004, pp. 276-286.
P. D. Friedberg, C. Tang, B. Singh, T. Brueckner, W. Gruendke, B. Schulz, and C. J. Spanos, "Time-based PEB adjustment for optimizing CD distributions," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver, Ed., Proceedings of SPIE, Vol. 5375, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2004, pp. 703-712.
J. P. Cain, H. Zhang, and C. J. Spanos, "Optimum sampling for characterization of systematic variation in photolithography," in Metrology, Inspection, and Process Control for Microlithography XVI, D. J. C. Herr, Ed., Proceedings of SPIE, Vol. 4689, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2002, pp. 430-442.
N. Jakatdar, X. Niu, J. Bao, C. J. Spanos, S. Yedur, and A. Deleporte, "Phase profilometry for the 193 nm lithography gate stack," in Metrology, Inspection, and Process Control for Microlithography XIV, N. T. Sullivan, Ed., Proceedings of SPIE, Vol. 3998, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2000, pp. 116-124.
J. Bao, X. Niu, N. Jakatdar, C. J. Spanos, and J. J. Bendik, "Specular spectral profilometry on metal layers," in Metrology, Inspection, and Process Control for Microlithography XIV, N. T. Sullivan, Ed., Proceedings of SPIE, Vol. 3998, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 2000, pp. 882-892.
X. Niu, N. Jakatdar, J. Bao, C. J. Spanos, and S. Yedur, "Specular spectroscopic scatterometry in DUV lithography," in Metrology, Inspection, and Process Control for Microlithography XIII, B. Singh, Ed., Proceedings of SPIE, Vol. 3677, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1999, pp. 159-168.
N. Jakatdar, J. Bao, C. J. Spanos, X. Niu, J. Bendik, and S. Hill, "A parameter extraction framework for DUV lithography simulation," in Metrology, Inspection, and Process Control for Microlithography XIII, B. Singh, Ed., Proceedings of SPIE, Vol. 3677, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1999, pp. 447-456.
N. Jakatdar, J. Bao, C. J. Spanos, R. Subramanian, and B. Rangarajan, "Physical modeling of deprotection induced thickness loss," in Advances in Resist Technology and Processing XVI, W. Conley, Ed., Proceedings of SPIE, Vol. 3678, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1999, pp. 275-282.
X. Niu, N. Jakatdar, and C. J. Spanos, "Deep ultraviolet lithography simulator tuning by resist profile matching," in Lithorgraphy for Semiconductor Manufacturing, C. A. Mack and T. Stevenson, Eds., Proceedings EUROPTO Series, Vol. 3741, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1999, pp. 245-252.
N. Jakatdar, J. Bao, C. J. Spanos, R. Subramanian, B. Rangarajan, and A. Romano, "Physically based model for predicting volume shrinkage in chemically amplified resists," in In-Line Characterization, Yield Reliability, and Failure Analyses in Microelectronic Manufacturing, K. Amberiadis, G. Kissinger, K. Okumura, S. Pabbisetty, and L. H. Weiland, Eds., Proceedings EUROPTO Series, Vol. 3743, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumenation Engineers, 1999, pp. 16-24.
N. Jakatdar, X. Niu, J. Musacchio, and C. J. Spanos, "In-situ metrology for deep ultraviolet lithography process control," in Metrology, Inspection, and Process Control for Microlithography XII, B. Singh, Ed., Proceedings of SPIE, Vol. 3332, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1998, pp. 262-270.
X. Niu, N. H. Jakatdar, C. J. Spanos, J. J. Bendik, and R. P. Kovacs, "Optical thin-film decomposition of DUV positive tone resist process monitoring," in Metrology, Inspection, and Process Control for Microlithography XII, B. Singh, Ed., Proceedings of SPIE, Vol. 3332, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1998, pp. 411-18.
N. Jakatdar, X. Niu, C. J. Spanos, A. Romano, J. Bendik, R. Kovacs, and S. Hill, "Characterization of a positive chemically amplified photoresist for process control," in Metrology, Inspection, and Process Control for Microlithography XII, B. Singh, Ed., Proceedings of SPIE, Vol. 3332, Bellingham, WA: SPIE -- Society for Photo-Optical Instrumentation Engineers, 1998, pp. 586-593.
N. Jakatdar, X. Niu, and C. J. Spanos, "A neural network approach to rapid thin film characterization," in Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays II, J. C. Stover, Ed., Proceedings of SPIE, Vol. 3275, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1998, pp. 163-171.
C. Yu, A. Minvielle, and C. J. Spanos, "SEM characterization of etch and develop contributions to poly CD error," in Metrology, Inspection, and Process Control for Microlithography X, S. K. Jones, Ed., Proceedings of SPIE, Vol. 2725, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1996, pp. 169-172.
R. L. Chen and C. J. Spanos, "Fuzzy inference system for semiconductor manufacturing processes," in Applications of Fuzzy Logic Technology II, B. Bosacchi and J. C. Bezdek, Eds., Proceedings of SPIE, Vol. 2493, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1995, pp. 273-286.
C. J. Spanos, S. Leang, S. Ma, J. Thomson, B. J. Bombay, and X. Niu, "A multistep supervisory controller for photolithographic operations," in Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing I: Proc. 1st Intl. Symp., M. Meyyappan, D. J. Economou, and S. W. Butler, Eds., Pennington, NJ: Electrochemical Society, 1995, pp. 3-17.
B. J. Bombay and C. J. Spanos, "Application of adaptive equipment models to a photolithographic process," in Process Module Metrology, Control and Clustering, C. J. Davis, I. P. Herman, and T. R. Turner, Eds., Proceedings of SPIE, Vol. 1594, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1992, pp. 277-284.
Z. Ling, S. Leang, and C. J. Spanos, "In-line supervisory control in a photolithographic workcell," in Advanced Techniques for Integrated Circuit Processing, J. A. Bondur and T. R. Turner, Eds., Proceedings of SPIE, Vol. 1392, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1991, pp. 660-669.
N. H. Chang and C. J. Spanos, "Chronological equipment diagnosis using evidence integration," in Applications of Artificial Intelligence VIII, M. M. Trivedi, Ed., Proceedings of SPIE, Vol. 1293, Bellingham, WA: SPIE -- Society of Photo-Optical Instrumentation Engineers, 1990, pp. 944-955.
X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, "Specular spectroscopic scatterometry," IEEE Trans. Semiconductor Manufacturing, vol. 14, no. 2, pp. 97-111, May 2001.
C. Yu, C. J. Spanos, H. Liu, and D. Bartelink, "Lithography error sources quantified by statistical metrology," Solid State Technology, vol. 39, no. 2, pp. 93-94, Feb. 1996.
J. Xue and C. J. Spanos, "An integrated aerial image sensor for lithography diagnostics," in Proc. 2007 Intl. Workshop on Electron Devices and Semiconductor Technology (IEDST 2007), T. Ren, J. Xu, and C. Yang, Eds., Piscataway, NJ: IEEE Press, 2007, pp. 96-100.
S. Wang, P. MacDonald, M. Kruger, C. J. Spanos, and M. Welch, "CD uniformity improvement and IC process monitoring by wireless sensor technology," in Proc. 7th Intl. Conf. on Solid-State and Integrated Circuits Technology (ICSICT 2004), R. Huang, M. Yu, J. Liou, T. Hiramoto, and C. Claeys, Eds., Vol. 1, Piscataway, NJ: IEEE Press, 2004, pp. 538-541.
R. Chang, Y. Cao, and C. J. Spanos, "Modeling metal dishing for interconnect optimization," in 2003 IEEE Intl. Electron Devices Meeting Technical Digest (IEDM '03), Piscataway, NJ: IEEE Press, 2003, pp. 249-252.
R. Chang and C. J. Spanos, "Full profile inter-layer dielectric CMP analysis," in Proc. 2001 IEEE Intl. Symp. on Semiconductor Manufacturing (ISSM 2001), Piscataway, NJ: IEEE Press, 2001, pp. 133-136.
M. Orshansky, C. Hu, and C. J. Spanos, "Circuit performance variability decomposition," in Proc. 4th Intl. Workshop on Statistical Metrology (IWSM 1999), Piscataway, NJ: IEEE Press, 1999, pp. 10-13.
A. M. Ison, W. Li, and C. J. Spanos, "Fault diagnosis of plasma etch equipment," in 1997 IEEE Intl. Symp. on Semiconductor Manufacturing Conf. Proc., Piscataway, NJ: IEEE Press, 1997, pp. B49-B52.
P. Tsai, C. J. Spanos, and F. Nadi, "A neural net based, in-line focus/exposure monitor," in Proc. 1994 IEEE/SEMI Advanced Semiconductor Manufacturing Conf. and Workshop (ASMC '94), Piscataway, NJ: IEEE Press, 1994, pp. 305-310.
C. J. Spanos, S. Leang, and S. Lee, "A control and diagnosis scheme for semiconductor manufacturing," in Proc. 1993 American Control Conf. (ACC '93), Evanston, IL: American Automatic Control Council, 1993, pp. 3008-3012.
E. D. Boskin, C. J. Spanos, and G. Korsh, "A method for modeling the manufacturability of IC designs," in Proc. 1993 IEEE Intl. Conf. on Microelectronic Test Structures (ICMTS '93), Piscataway, NJ: IEEE Press, 1993, pp. 241-246.
G. S. May and C. J. Spanos, "Automated malfunction diagnosis of a plasma etcher," in Proc. 3rd Annual IEEE/SEMI Intl. Symp. on Semiconductor Manufacturing Science Symp. (ISMSS 1991), Piscataway, NJ: IEEE Press, 1991, pp. 62-68.
H. Guo, C. J. Spanos, and A. J. Miller, "Real time statistical process control for plasma etching," in Proc. 3rd IEEE/SEMI Intl. Semiconductor Manufacturing Science Symp. (ISMSS 1991), Piscataway, NJ: IEEE Press, 1991, pp. 113-118.
K. Lin and C. J. Spanos, "Computer-aided recipe generation for LPCVD reactors," in Proc. IEEE/SEMI Advanced Semiconductor Manufacturing Conf. and Workshop (ASMC '90), Piscataway, NJ: IEEE Press, 1990, pp. 61-62.
D. A. Hodges, L. A. Rowe, and C. J. Spanos, "Computer integrated manufacturing," in Proc. 7th IEEE/CHMT Intl. Electronic Manufacturing Technology Symp. (IEMT 1989), Piscataway, NJ: IEEE Press, 1989, pp. 1-3.
C. J. Spanos, "Hippocrates: A methodology for IC process diagnosis," in IEEE Intl. Conf. on Computer-Aided Design (ICCAD-86). Digest of Technical Papers, Washington, DC: IEEE Computer Society Press, 1986, pp. 513-516.
S. W. Director and C. J. Spanos, "PROMETHEUS: A program for VLSI process parameter extraction," in IEEE Intl. Conf. on Computer-Aided Design (ICCAD-83). Digest of Technical Papers, Piscataway, NJ: IEEE Press, 1983, pp. 176-177.
C. J. Spanos, J. Chen, R. Chen, C. Fields, H. Huang, A. Ison, X. Niu, D. Park, J. Tao, M. Terrovitis, and A. Wang, "Special Issues in Semiconductor Manufacturing," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M95/64, Aug. 1995.
C. J. Spanos, J. Chen, M. Cohn, M. Hatzilambrou, A. Miranda, and R. Schenker, "Special Issues in Semiconductor Manufacturing," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M95/63, Aug. 1995.
C. J. Spanos, B. Bombay, S. Cunningham, Z. Daoud, J. Helmsen, J. King, H. Liu, D. Newmark, J. Noriega-Asturias, J. Thomson, C. Yu, E. Boskin, and D. Hebert, "Special Issues in Semiconductor Manufacturing III," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M92/84, Aug. 1992.
C. J. Spanos, E. Boskin, R. Chen, Z. Daoud, and H. Liu, "IC Design for Manufacturability 1," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M92/17, Feb. 1992.
C. J. Spanos, R. Chen, S. Leang, and N. Tam, "Special Issues in Semiconductor Manufacturing," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M91/8, Jan. 1991.
C. J. Spanos, E. Boskin, Y. Fong, T. Garfinkel, H. Guo, C. Hegarty, T. Hu, S. Lee, T. Luan, G. May, J. Ramirez, and E. Rosenbaum, "Special Issues in Semiconductor Manufacturing," EECS Department, University of California, Berkeley, Tech. Rep. UCB/ERL M90/8, Jan. 1990. [abstract]
R. S. Mundt, P. D. MacDonald, A. Beers, M. L. Freed, and C. J. Spanos, "Methods of and apparatuses for measuring electrical parameters of a plasma process," U.S. Patent Application. Nov. 2005.
P. D. MacDonald, M. V. P. Kruger, M. Welch, M. L. Freed, and C. J. Spanos, "Methods of and apparatuses for maintenance, diagnosis, and optimization of processes," U.S. Patent Application. July 2005.
M. L. Freed, R. S. Mundt, and C. J. Spanos, "Sensor apparatus management methods and apparatus," U.S. Patent Application. July 2004.
K. Weekly, "Applied Estimation of Mobile Environments," A. Bayen, K. Pister, C. J. Spanos, and S. Glaser, Eds., EECS Department, University of California, Berkeley, Tech. Rep. UCB/EECS-2014-32, April 2014. [abstract]