Investigation of Process Technology Elements (M91/66)
William G. Oldham and Andrew R. Neureuther

Test Structures for the Electrical Characterization of Optical Lithography (M88/39)
Andrew R. Neureuther, William G. Oldham, R.C. Anderson, D.M. Drako, W.E. Haller, B. Huynh, D.E. Lyons, G.R. Misium, D.P. Sutija, K.K.H. Toh and B. Uathavikul

Test Structures for the Visual Characterization of Optical Lithography (M88/38)
Andrew R. Neureuther, William G. Oldham, R.C. Anderson, D.M. Drako, W.E. Haller, B. Huynh, D.E. Lyons, G.R. Misium, D.P. Sutija, K.K.H. Toh and B. Uathavikul

Berkeley CMOS Process: A User Guide (M84/84)
William G. Oldham, Andrew R. Neureuther, Y. Shacham and F. Dupois

Berkeley CMOS Process Test Patterns (M84/26)
William G. Oldham, Andrew R. Neureuther and Y. Shacham