Ph.D. Dissertations - Andrew R. Neureuther

Key Challenges in EUV Mask Technology: Actinic Mask Inspection and Mask 3D Effects
Yow-Gwo Wang [2017]

Study of Line Edge Roughness and Interactions of Secondary Electrons in Photoresists for EUV Lithography
Suchit Bhattarai [2017]

Study of Line Edge Roughness and Interactions of Secondary Electrons in Photoresists for EUV Lithography
Suchit Bhattarai [2017]

Compensation for Lithography Induced Process Variations during Physical Design
Eric Chin [2011]

Design and Measurement of Parameter-Specific Ring Oscillators
Lynn Tao-Ning Wang [2010]

Mask Edge Effects in Optical Lithography and Chip Level Modeling Methods
Marshal Miller [2010]

Pattern Matching for Advanced Lithographic Technologies
Juliet Alison Rubinstein [2010]

Simulation and Compensation Methods for EUV Lithography Masks with Buried Defects
Chris Heinz Clifford [2010]

Simulation Framework for Electromagnetic Effects in Plasmonics, Filter Apertures, Wafer Scattering, Grating Mirrors, and Nano-Crystals
Daniel Peter Ceperley [2008]

Collaborative Platform for DFM
Wojciech Jacob Poppe [2007]

Characterizing Polarized Illumination in High Numerical Aperture Optical Lithography with Phase Shifting Masks
Gregory Russell McIntyre [2006]

Modeling Innovations in EUV and Nanoimprint Lithography
Yunfei Deng [2005]

Linking TCAD and EDA Through Pattern Matching
Frank E. Gennari [2004]

Enhanced, Quantitative Analysis of Resist Image Contrast upon Line Edge Roughness (LER)
Michael V. Williamson [2003]

Comprehensive Model for Projection Photolithography: Rigorous, Fast and Novel Processing
Mosong Cheng [2002]

Domain Decomposition Methods for the Electromagnetic Simulation of Scattering from Three-Dimensional Structures with Applications in Lithography
Konstantinos Adam [2001]

Electromagnetic Simulation and Modeling with Applications in Lithography
Thomas V. Pistor [2001]

Fundamental Mechanisms in Advanced Resist Systems in Optical Lithography
Marco A. Zuniga [1999]

Propagation Effects of Partially Coherent Light in Optical Lithography and Inspection
Robert J. Socha [1997]

Centralizing Geometry Services for Three-Dimensional Integrated Circuits Topography Simulation
Robert H.-F. Wang [1995]

Validity of the Classical Theory of Spontaneous Emission and the Fast Multipole Method for Electromagnetic Scattering
Si Chuen Michael Yeung [1995]

A Comparison of Three Dimensional Photolithography Simulators
John J. Helmsen [1994]

Optical Proximity Correction for Resolution Enhancement Technology
David M. Newmark [1994]

Rigorous Three-Dimensional Time-Domain Finite-Difference Electromagnetic Simulation
Alfred K.-K. Wong [1994]

Technology Computer-Aided Design Frameworks and the PROSE Implementation
Alexander S.-W. Wong [1992]

Algorithms for Three-Dimensional Simulation of Etching and Deposition Processes in Integrated Circuit Fabrication
Edward W. Scheckler [1991]

Modeling and Simulation of Reaction Kinetics in Advanced Resist Processes for Optical Lithograpy
Richard A. Ferguson [1991]

Resist Mechanisms and Models in Electron-Beam Lithography
Nelson N.-S. Tam [1991]

Algorithms for Three-Dimensional Simulation of Photoresist Development
Kenny K. H. Toh [1990]

Characterization of Inorganic Resist for VLSI Fabrication
Wingyu Leung [1985]

SIMPL-2 (Simulated Profiles from the Layout - Version 2)
Keunmyung Lee [1985]

A Family of Simulation Programs for IC Fabrication Processes (Their Structure, Design, and Implementation)
Sharad N. Nandgaonkar [1984]

Analysis of Backscattered Electron Signals for X-ray Mask Inspection
Michael G. Rosenfield [1984]

Characterization of Plasma Etched Structures in IC Processing
John L. Reynolds [1983]

Alignment Signals from Electrons Scattering near an Edge for Electron Beam Microfabrication
Yi-Ching Lin [1981]

Simulation of Optically Formed Image Profiles in Positive Photoresist
Michael M. O'Toole [1979]

Simulation of Optically Formed Image Profiles in Positive Photoresist
Michael Marson O'Toole [1979]

X-Ray Lithographic Fabrication of Blazed Diffraction Gratings
Paul I. Hagouel [1976]

On the Numerical Analysis of Thin-Wire Antennas Mounted on a Conducting Sphere
Fredereick M. Tesche [1971]

Numerical Integral-Equation Analysis of Scattering from Diffraction Gratings
Hassan A. Kalhor [1970]

Numerical Methods for the Analysis of Scattering from Nonplanar Periodic Structures
Kawthar A. El Hamid Zaki [1969]