Ph.D. Dissertations - Costas J. Spanos

Data-efficient Analytics for Optimal Human-Cyber-Physical Systems
Ming Jin [2017]

Statistical Learning for Sparse Sensing and Agile Operation
Yuxun Zhou [2017]

Variability-Aware Compact Modeling of Nano-scale Technologies with Customized Test Structure Designs
Ying Qiao [2017]

Efficient Multi-Level Modeling and Monitoring of End-use Energy Profile in Commercial Buildings
Zhaoyi Kang [2015]

Modeling and Selection for Real-time Wafer-to-Wafer Fault Detection Applications
Jae Yeon (Claire) Baek [2015]

Variability Modeling and Statistical Parameter Extraction for CMOS Devices
Kun Qian [2015]

Statistical Methods for Enhanced Metrology in Semiconductor/Photovoltaic Manufacturing
Dekong Zeng [2012]

Statistical Verification and Optimization of Integrated Circuits
Yu Ben [2011]

Uncertainty Propagation in Transistor-level Statistical Circuit Analysis
Qian Ying Tang [2011]

Intrinsic and Systematic Variability in Nanometer CMOS Technologies
Kedar Patel [2010]

In-Situ, Portable Monitoring Methods for Photolithography Characterization
Jing Xue [2009]

Spatial Modeling of Gate Length Variation for Process-Design Co-Optimization
Paul David Friedberg [2007]

Characterization of the Critical Dimension Error Budget for Extreme Ultraviolet Lithography
Jason P. Cain [2004]

Integrated CMP Metrology and Modeling with Respect to Circuit Performance
Runzi Chang [2004]

An Optical Metrology System for Lithography Process Monitoring and Control
Junwei Bao [2003]

Causal Analysis of Systematic Spatial Variation in Optical Lithography
Haolin Zhang [2002]

Wafer-Mounted Sensor Arrays for Plasma Etch Processes
Mason L. Freed [2001]

Deep Sub-Micron Photolithography Control Through In-Line Metrology
Nickhil H. Jakatdar [2000]

An Integrated System of Optical Metrology for Deep Submicron Lithography
Xinhui Niu [1999]

Probabilistic Modeling for Fault Classification of Plasma Equipment
A. M. Ison [1999]

OES-Based Sensing for Plasma Processing in IC Manufacturing
Roa Wen Chen [1998]

Integrated Circuit Process Design for Manufacturability Using Statistical Metrology
Crid Yu [1996]

A Control and Diagnostic System for the Photolithography Process Sequence
Sovarong Leang [1995]

A Methodology for Modeling the Manufacturability of Integrated Circuits
Eric D. Boskin [1995]

A Qualitative Modeling Framework of Semiconductor Manufacturing Processes: Self-Learning Fuzzy Inference System and the Statistical Analysis of Categorical Data
Raymond L. Chen [1994]

Semiconductor Equipment Analysis and Wafer State Prediction System Using Real-Time Signals
Sherry F. Lee [1994]

Automated Malfunction Diagnosis of Integrated Circuit Manufacturing Equipment
Gary S. May [1991]

Modeling and Characterization of Semiconductor Manufacturing Equipment: An Application to LPCVD Reactors
Kuang-Kuo Lin [1990]

Monitoring, Maintenance and Diagnosis in a Computer-Integrated Environment for Semiconductor Manufacturing
Norman H. Chang [1990]